Açık Akademik Arşiv Sistemi

Effect of source to the substrate distance on thermoelectric properties of copper nitride thin films grown by thermal evaporation method

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dc.contributor.authors Basha, B; Jacob, J; Tanveer, Z; Ali, A; Amin, N; Javaid, K; Ikram, S; Mahmood, K; ul Ahmad, A; Al-Buriahi, MS; Alrowaili, ZA; Wang, HC; Sun, YQ
dc.date.accessioned 2024-02-23T11:45:10Z
dc.date.available 2024-02-23T11:45:10Z
dc.date.issued 2023
dc.identifier.issn 2238-7854
dc.identifier.uri http://dx.doi.org/10.1016/j.jmrt.2023.05.238
dc.identifier.uri https://hdl.handle.net/20.500.12619/102161
dc.description Bu yayın 06.11.1981 tarihli ve 17506 sayılı Resmî Gazete’de yayımlanan 2547 sayılı Yükseköğretim Kanunu’nun 4/c, 12/c, 42/c ve 42/d maddelerine dayalı 12/12/2019 tarih, 543 sayılı ve 05 numaralı Üniversite Senato Kararı ile hazırlanan Sakarya Üniversitesi Açık Bilim ve Açık Akademik Arşiv Yönergesi gereğince açık akademik arşiv sistemine açık erişim olarak yüklenmiştir.
dc.description.abstract This research is carried out to establish a link between thermoelectric properties of Copper Nitride (Cu3N) thin films with its growth parameters. A series of Cu3N thin films is syn-thesized by thermal evaporation technique on glass substrate using different source to substrate distances (21-27 cm) by vacuum tube furnace. X-ray diffraction (XRD), Raman spectroscopy, and Scanning Electron Microscopy (SEM) were used to evaluate different structural, vibrational and morphological properties. A 25 cm source to substrate distance is found to be an optimal value for the highest Seebeck coefficient and electrical conduc-tivity. It is further observed that the Cu3N phase was fully developed at this optimal source to substrate distance. These findings are justifiable because at optimal distance, nitrogen atoms are able to acquire required thermal energy which needed for bonding with Cu atoms.& COPY; 2023 The Author(s). Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).
dc.language English
dc.language.iso eng
dc.publisher ELSEVIER
dc.relation.isversionof 10.1016/j.jmrt.2023.05.238
dc.subject Copper nitride
dc.subject Thermal evaporation method
dc.subject Thin films
dc.subject Thermoelectric properties
dc.title Effect of source to the substrate distance on thermoelectric properties of copper nitride thin films grown by thermal evaporation method
dc.type Article
dc.identifier.volume 25
dc.identifier.startpage 265
dc.identifier.endpage 272
dc.relation.journal JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T
dc.identifier.doi 10.1016/j.jmrt.2023.05.238
dc.identifier.eissn 2214-0697
dc.contributor.author Basha, Beriham
dc.contributor.author Jacob, Jolly
dc.contributor.author Tanveer, Z.
dc.contributor.author Ali, A.
dc.contributor.author Amin, N.
dc.contributor.author Javaid, K.
dc.contributor.author Ikram, Salma
dc.contributor.author Mahmood, K.
dc.contributor.author ul Ahmad, Aqrab
dc.contributor.author Al-Buriahi, M. S.
dc.contributor.author Alrowaili, Z. A.
dc.contributor.author Wang, Hongchao
dc.relation.publicationcategory Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rights.openaccessdesignations gold


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